photorealistic-law-environment

Removing Antibiotics from Water by UVC-LED/H2O2: Process Optimization Using a Flow-Through UV Reactor

Xiaoyu Sun*, Eason Liao**

*Unit 542, 5/F, Building 5W, Phase One, Hong Kong Science Park, Pak Shek Kok, New Territories, Hong Kong, zoesun@massphoton.com

**Unit 542, 5/F, Building 5W, Phase One, Hong Kong Science Park, Pak Shek Kok, New Territories, Hong Kong, eason@massphoton.com

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21st IWA Leading Edge Conferenceon Water and Wastewater Technologies
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